waveguide_width
float32 0.5
2
| waveguide_height
float32 200
600
| cladding_material
stringclasses 3
values | cladding_thickness
float32 1
5
| deposition_method
stringclasses 3
values | etch_method
stringclasses 3
values | sidewall_roughness
float32 0.5
5
| annealing_params
stringclasses 4
values | wavelength
float32 1.5k
1.6k
| polarization
stringclasses 2
values | input_power
float32 -10
10
| temperature
float32 20
80
| bend_radius
float32 20
200
| device_length
float32 1
50
| insertion_loss
float32 0.53
26.5
| propagation_loss
float32 0.1
5
| coupling_efficiency_input
float32 40
90
| coupling_efficiency_output
float32 40
90
| scattering_loss
float32 0.01
0.5
| effective_index
float32 1.5
2
| mode_confinement_factor
float32 0.7
0.95
| batch_id
stringclasses 50
values | data_source
stringclasses 2
values | measurement_method
stringclasses 4
values | uncertainty
float32 0.01
0.2
|
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
1.888 | 402.950012 | Polymer | 2.58 | PECVD | RIE | 1.24 | 900C_3hr | 1,546.430054 | TM | 0.54 | 55.080002 | 149.960007 | 12.57 | 4.47 | 2.62 | 85.559998 | 88.209999 | 0.179 | 1.714 | 0.875 | BATCH_50 | Measurement | microring_Q | 0.051 |
1.928 | 517.900024 | SiO2 | 1.23 | PECVD | Wet Etch | 1.67 | 1000C_1hr | 1,550.829956 | TE | -7.1 | 49.889999 | 131.669998 | 32.57 | 16.304001 | 4.744 | 77.230003 | 50.07 | 0.213 | 1.768 | 0.855 | BATCH_16 | Measurement | OTDR | 0.025 |
1.598 | 227.399994 | Air | 2.21 | LPCVD | RIE | 3.45 | 900C_1hr | 1,502.670044 | TM | -8.6 | 64.230003 | 107.470001 | 39.209999 | 17.705 | 4.173 | 57.040001 | 55.400002 | 0.066 | 1.896 | 0.726 | BATCH_36 | Measurement | ring_resonance | 0.063 |
0.786 | 238.070007 | SiO2 | 3.01 | PECVD | Wet Etch | 3.68 | No_Anneal | 1,596.829956 | TE | -5.12 | 72.330002 | 42.939999 | 34.119999 | 12.992 | 3.331 | 59.630001 | 58.98 | 0.176 | 1.882 | 0.823 | BATCH_17 | Synthetic | microring_Q | 0.074 |
0.696 | 337.160004 | Polymer | 3.98 | Sputtering | ICP | 2 | 1000C_1hr | 1,552.390015 | TE | 6.6 | 51.470001 | 127.68 | 49.580002 | 7.558 | 1.218 | 55.630001 | 83.440002 | 0.342 | 1.952 | 0.841 | BATCH_22 | Measurement | cut-back | 0.194 |
0.828 | 377.559998 | Air | 4.12 | PECVD | ICP | 1.64 | No_Anneal | 1,564.030029 | TE | -6.14 | 77.190002 | 49.939999 | 25.23 | 9.792 | 3.563 | 55.029999 | 52.970001 | 0.447 | 1.815 | 0.79 | BATCH_11 | Measurement | ring_resonance | 0.16 |
0.787 | 247.059998 | Air | 2.45 | Sputtering | Wet Etch | 1.72 | No_Anneal | 1,507.569946 | TE | -8.86 | 59.889999 | 82.389999 | 20.690001 | 8.193 | 3 | 50.25 | 68.870003 | 0.294 | 1.93 | 0.924 | BATCH_12 | Synthetic | microring_Q | 0.03 |
0.891 | 369.880005 | Polymer | 4.95 | Sputtering | Wet Etch | 3.78 | 900C_3hr | 1,544.900024 | TE | 4.17 | 26.700001 | 113.230003 | 12.39 | 2.742 | 1.203 | 79.940002 | 80.410004 | 0.039 | 1.508 | 0.849 | BATCH_16 | Synthetic | cut-back | 0.188 |
1.999 | 288.140015 | Air | 1.87 | Sputtering | ICP | 4.11 | 900C_1hr | 1,592.22998 | TM | 7.84 | 37.830002 | 172.279999 | 43.889999 | 3.156 | 0.311 | 63.849998 | 62.23 | 0.266 | 1.869 | 0.741 | BATCH_22 | Measurement | cut-back | 0.088 |
1.764 | 405.369995 | Air | 1.25 | LPCVD | RIE | 1.72 | 1000C_1hr | 1,511.569946 | TM | 9.56 | 45.849998 | 199.110001 | 9.82 | 4.166 | 3.079 | 68.410004 | 82.860001 | 0.352 | 1.958 | 0.848 | BATCH_24 | Measurement | OTDR | 0.141 |
1.72 | 272.880005 | SiO2 | 4.35 | LPCVD | ICP | 2.36 | 1000C_1hr | 1,583.400024 | TE | -1.93 | 37.529999 | 76.040001 | 29.969999 | 11.876 | 3.422 | 89.110001 | 63.200001 | 0.354 | 1.735 | 0.714 | BATCH_35 | Synthetic | microring_Q | 0.111 |
1.619 | 226.559998 | Air | 3.07 | PECVD | ICP | 0.73 | 900C_1hr | 1,507.560059 | TE | 2.29 | 79.449997 | 52.630001 | 27.65 | 13.272 | 4.393 | 69.459999 | 48.950001 | 0.025 | 1.929 | 0.745 | BATCH_2 | Synthetic | OTDR | 0.127 |
1.539 | 236.350006 | Air | 1.23 | Sputtering | RIE | 3.96 | No_Anneal | 1,536.280029 | TM | -1.49 | 63.41 | 193.130005 | 40.779999 | 9.978 | 1.968 | 40.68 | 69.410004 | 0.092 | 1.923 | 0.759 | BATCH_10 | Synthetic | OTDR | 0.155 |
1.763 | 531.26001 | Air | 3.85 | LPCVD | ICP | 4.12 | 900C_1hr | 1,516.890015 | TE | 3.97 | 52.869999 | 199.850006 | 4.66 | 3.55 | 3.49 | 63.900002 | 57.240002 | 0.337 | 1.818 | 0.922 | BATCH_29 | Synthetic | ring_resonance | 0.018 |
0.643 | 559.049988 | Polymer | 1.12 | PECVD | ICP | 3.01 | 1000C_1hr | 1,597.030029 | TE | -8.68 | 36.189999 | 83.599998 | 10.68 | 5.218 | 3.697 | 43.060001 | 40.040001 | 0.244 | 1.596 | 0.922 | BATCH_46 | Synthetic | OTDR | 0.088 |
1.559 | 206.020004 | SiO2 | 1.66 | PECVD | Wet Etch | 4.53 | 900C_1hr | 1,591.680054 | TE | -9.7 | 57.580002 | 99.639999 | 3.31 | 2.539 | 3.459 | 48.669998 | 62.400002 | 0.384 | 1.567 | 0.7 | BATCH_8 | Synthetic | cut-back | 0.068 |
1.202 | 534.890015 | SiO2 | 2.31 | Sputtering | Wet Etch | 4.01 | 900C_1hr | 1,596.800049 | TM | 7.9 | 36.34 | 93.879997 | 20.92 | 9.271 | 3.52 | 82.589996 | 72.260002 | 0.277 | 1.76 | 0.758 | BATCH_10 | Synthetic | cut-back | 0.043 |
1.132 | 221.240005 | Air | 3.23 | PECVD | RIE | 1.25 | No_Anneal | 1,574.099976 | TM | -6.77 | 62.740002 | 88.889999 | 4.57 | 2.893 | 4.016 | 51.099998 | 89.620003 | 0.164 | 1.953 | 0.788 | BATCH_41 | Measurement | ring_resonance | 0.141 |
0.883 | 391.040009 | SiO2 | 1.09 | Sputtering | RIE | 2.5 | 900C_1hr | 1,547.569946 | TM | -9.63 | 31.93 | 137.729996 | 38.130001 | 7.063 | 1.507 | 72.309998 | 46.610001 | 0.161 | 1.99 | 0.898 | BATCH_12 | Synthetic | ring_resonance | 0.179 |
0.624 | 574.179993 | Air | 3.85 | PECVD | ICP | 2.88 | No_Anneal | 1,548.459961 | TE | -0.66 | 37.919998 | 72.580002 | 3.34 | 2.27 | 0.995 | 63.939999 | 47.41 | 0.15 | 1.849 | 0.77 | BATCH_24 | Synthetic | cut-back | 0.021 |
0.859 | 370.709991 | SiO2 | 3.99 | LPCVD | Wet Etch | 1.02 | 900C_3hr | 1,503.819946 | TE | -7.43 | 55.110001 | 151.130005 | 10.78 | 5.745 | 4.459 | 78.160004 | 71.110001 | 0.419 | 1.541 | 0.803 | BATCH_3 | Measurement | ring_resonance | 0.02 |
1.372 | 320.170013 | Air | 4.33 | PECVD | ICP | 1.27 | No_Anneal | 1,588.150024 | TM | 3.87 | 28.280001 | 172.839996 | 39.889999 | 20.378 | 4.854 | 87.82 | 56.150002 | 0.486 | 1.587 | 0.834 | BATCH_46 | Synthetic | OTDR | 0.078 |
1.761 | 391.589996 | SiO2 | 4.91 | PECVD | ICP | 0.93 | 900C_1hr | 1,515.77002 | TM | -6.81 | 67.029999 | 194.429993 | 15.73 | 8.524 | 4.944 | 69.510002 | 51.34 | 0.137 | 1.88 | 0.937 | BATCH_48 | Measurement | OTDR | 0.043 |
1.962 | 252.029999 | Polymer | 3.85 | Sputtering | ICP | 2.73 | 900C_3hr | 1,523.569946 | TM | -6.86 | 57.849998 | 175.279999 | 27.540001 | 6.742 | 1.844 | 66.980003 | 89.089996 | 0.06 | 1.921 | 0.713 | BATCH_15 | Measurement | microring_Q | 0.138 |
1.558 | 498.25 | Polymer | 4.7 | PECVD | ICP | 2.66 | No_Anneal | 1,598.449951 | TE | -3.57 | 68.959999 | 99.550003 | 39.32 | 8.646 | 1.873 | 78.309998 | 42.110001 | 0.306 | 1.998 | 0.922 | BATCH_46 | Measurement | ring_resonance | 0.067 |
0.85 | 380.720001 | SiO2 | 3.26 | PECVD | ICP | 0.94 | 1000C_1hr | 1,589.699951 | TE | -5.88 | 42.900002 | 101.400002 | 4.57 | 0.687 | 0.259 | 80.190002 | 82.059998 | 0.184 | 1.934 | 0.896 | BATCH_8 | Synthetic | OTDR | 0.125 |
0.962 | 343.980011 | Air | 4.95 | PECVD | RIE | 4.2 | 900C_1hr | 1,588.780029 | TE | -5.59 | 46.939999 | 42.220001 | 26.42 | 13.556 | 4.418 | 50.48 | 64.019997 | 0.027 | 1.892 | 0.793 | BATCH_19 | Synthetic | ring_resonance | 0.133 |
0.56 | 406.109985 | Polymer | 4.09 | LPCVD | Wet Etch | 0.89 | 900C_3hr | 1,545.22998 | TM | 4.65 | 62.18 | 46.75 | 29.68 | 3.999 | 0.983 | 49.91 | 50.950001 | 0.013 | 1.699 | 0.726 | BATCH_16 | Synthetic | OTDR | 0.076 |
1.948 | 211.070007 | SiO2 | 1.38 | Sputtering | Wet Etch | 0.93 | 900C_1hr | 1,547.069946 | TE | -5.28 | 64.879997 | 181.690002 | 47.009998 | 13.099 | 2.606 | 52.009998 | 69.389999 | 0.238 | 1.686 | 0.935 | BATCH_22 | Synthetic | ring_resonance | 0.038 |
1.144 | 238.25 | SiO2 | 3.24 | Sputtering | Wet Etch | 1.74 | 1000C_1hr | 1,530.790039 | TM | 6.45 | 52.669998 | 37.080002 | 20.1 | 2.528 | 0.46 | 44.419998 | 85.290001 | 0.274 | 1.782 | 0.889 | BATCH_36 | Measurement | microring_Q | 0.063 |
1.457 | 337.48999 | SiO2 | 4.25 | PECVD | RIE | 4.68 | 1000C_1hr | 1,530.619995 | TE | 1.92 | 72.900002 | 165.619995 | 29.790001 | 9.522 | 2.541 | 64.449997 | 77.919998 | 0.024 | 1.568 | 0.757 | BATCH_22 | Synthetic | cut-back | 0.1 |
0.801 | 330.630005 | SiO2 | 2.98 | PECVD | Wet Etch | 0.95 | No_Anneal | 1,525.949951 | TE | 9.48 | 32.380001 | 72.43 | 26.34 | 9.597 | 3.124 | 79.300003 | 56.220001 | 0.484 | 1.653 | 0.874 | BATCH_34 | Synthetic | cut-back | 0.082 |
1.013 | 372.079987 | Air | 4.76 | Sputtering | ICP | 3.66 | No_Anneal | 1,515.859985 | TM | 5.17 | 45.919998 | 157.179993 | 13.17 | 5.87 | 3.896 | 66.050003 | 66.050003 | 0.018 | 1.869 | 0.715 | BATCH_6 | Synthetic | microring_Q | 0.126 |
0.898 | 287.220001 | Polymer | 3.36 | PECVD | RIE | 4.21 | No_Anneal | 1,554.52002 | TM | 8.71 | 25.780001 | 106.919998 | 18.299999 | 1.681 | 0.377 | 79.080002 | 46.59 | 0.223 | 1.641 | 0.843 | BATCH_18 | Measurement | OTDR | 0.094 |
1.506 | 585.72998 | Air | 1.27 | Sputtering | ICP | 1.64 | No_Anneal | 1,501.98999 | TE | -4.97 | 78.080002 | 94.57 | 42.509998 | 18.473 | 3.985 | 78.580002 | 41.59 | 0.09 | 1.796 | 0.822 | BATCH_43 | Synthetic | microring_Q | 0.076 |
1.96 | 233.070007 | Air | 3.83 | Sputtering | Wet Etch | 2.6 | 900C_3hr | 1,584.689941 | TE | 4.23 | 51.290001 | 50.759998 | 6.43 | 2.873 | 3.302 | 63.77 | 68.550003 | 0.377 | 1.691 | 0.714 | BATCH_37 | Measurement | OTDR | 0.073 |
1.389 | 210.690002 | Polymer | 4.88 | PECVD | Wet Etch | 3.13 | 1000C_1hr | 1,555.27002 | TM | 3.52 | 73.43 | 101.980003 | 5.71 | 3.299 | 4.028 | 49.48 | 85.970001 | 0.054 | 1.831 | 0.847 | BATCH_43 | Measurement | OTDR | 0.031 |
1.935 | 379.820007 | Polymer | 4.68 | LPCVD | RIE | 0.65 | 900C_3hr | 1,501.650024 | TE | -7.38 | 64.209999 | 172.940002 | 23.73 | 7.12 | 2.56 | 78.169998 | 87.669998 | 0.249 | 1.767 | 0.783 | BATCH_30 | Measurement | microring_Q | 0.13 |
1.609 | 581.460022 | SiO2 | 4.89 | PECVD | Wet Etch | 2.09 | 1000C_1hr | 1,501.670044 | TM | -6.35 | 72.699997 | 80.870003 | 16.5 | 3.056 | 0.992 | 73.709999 | 68.739998 | 0.201 | 1.876 | 0.934 | BATCH_37 | Measurement | microring_Q | 0.162 |
1.83 | 404.75 | Air | 4.78 | LPCVD | ICP | 4.03 | 1000C_1hr | 1,547.800049 | TE | -4.38 | 21.389999 | 45.41 | 37.029999 | 14.952 | 3.527 | 87.889999 | 73.910004 | 0.148 | 1.527 | 0.765 | BATCH_47 | Measurement | ring_resonance | 0.166 |
1.924 | 277.200012 | SiO2 | 1.31 | PECVD | ICP | 4.17 | 900C_3hr | 1,524.25 | TM | -7.22 | 61.060001 | 29.4 | 33.419998 | 8.973 | 2.504 | 57.669998 | 67.849998 | 0.214 | 1.775 | 0.91 | BATCH_19 | Synthetic | microring_Q | 0.032 |
0.789 | 221.039993 | Polymer | 1.58 | Sputtering | Wet Etch | 3.48 | No_Anneal | 1,584.5 | TE | -4.01 | 47.049999 | 188.630005 | 5.92 | 1.261 | 0.803 | 80.790001 | 48.619999 | 0.43 | 1.806 | 0.922 | BATCH_18 | Measurement | ring_resonance | 0.027 |
0.735 | 542.200012 | SiO2 | 3.33 | PECVD | ICP | 1.95 | 900C_3hr | 1,564.680054 | TM | 7.2 | 36.349998 | 171.139999 | 15.34 | 7.857 | 4.127 | 85.57 | 72.279999 | 0.068 | 1.775 | 0.894 | BATCH_37 | Synthetic | cut-back | 0.026 |
1.579 | 585.419983 | Polymer | 1.19 | PECVD | Wet Etch | 3.58 | 900C_3hr | 1,532.390015 | TM | -3.43 | 38.080002 | 107.709999 | 45.290001 | 6.686 | 1.187 | 62.669998 | 41.099998 | 0.132 | 1.651 | 0.894 | BATCH_6 | Measurement | microring_Q | 0.107 |
1.322 | 435.540009 | Air | 3.81 | Sputtering | RIE | 1.55 | 1000C_1hr | 1,540.459961 | TM | -3.97 | 28.27 | 166.619995 | 26.08 | 3.382 | 0.657 | 83.639999 | 45.73 | 0.192 | 1.619 | 0.869 | BATCH_43 | Measurement | OTDR | 0.13 |
0.895 | 444.329987 | Air | 4.6 | LPCVD | ICP | 2.52 | 900C_1hr | 1,505.040039 | TE | -8.58 | 57.110001 | 175.570007 | 21 | 9.65 | 3.695 | 83.230003 | 71.010002 | 0.424 | 1.803 | 0.761 | BATCH_42 | Synthetic | OTDR | 0.181 |
1.875 | 394.019989 | SiO2 | 4.69 | PECVD | Wet Etch | 3.68 | No_Anneal | 1,562.569946 | TM | -2.25 | 28.559999 | 150.839996 | 29.879999 | 7.032 | 1.952 | 65.75 | 78.019997 | 0.017 | 1.98 | 0.771 | BATCH_19 | Synthetic | microring_Q | 0.027 |
1.168 | 322.149994 | Polymer | 2.22 | LPCVD | Wet Etch | 4.48 | 900C_1hr | 1,598.959961 | TE | 1.23 | 70.25 | 142.419998 | 33.369999 | 14.523 | 4.074 | 86.43 | 80.480003 | 0.462 | 1.709 | 0.947 | BATCH_3 | Measurement | microring_Q | 0.132 |
1.363 | 307.339996 | Polymer | 2.81 | LPCVD | Wet Etch | 4.41 | 900C_1hr | 1,593.530029 | TE | 1.95 | 56.16 | 50.349998 | 10.42 | 5.453 | 3.523 | 80.550003 | 63.07 | 0.217 | 1.924 | 0.875 | BATCH_35 | Measurement | microring_Q | 0.056 |
0.554 | 534.440002 | Polymer | 3.76 | Sputtering | Wet Etch | 2.07 | 900C_1hr | 1,516.160034 | TM | -4.05 | 59.990002 | 68.610001 | 44.43 | 12.857 | 2.731 | 80.790001 | 68.93 | 0.027 | 1.581 | 0.945 | BATCH_41 | Measurement | microring_Q | 0.114 |
1.512 | 277.290009 | Air | 4.54 | PECVD | Wet Etch | 3.54 | 1000C_1hr | 1,517.069946 | TM | 5.62 | 59.360001 | 81.459999 | 8.35 | 5.033 | 4.218 | 81.050003 | 42.259998 | 0.445 | 1.557 | 0.845 | BATCH_47 | Synthetic | microring_Q | 0.104 |
0.505 | 584.77002 | Air | 2.84 | LPCVD | RIE | 4.32 | 900C_1hr | 1,513.869995 | TM | 9.29 | 30.440001 | 177.990005 | 14.44 | 6.387 | 3.998 | 52.02 | 46.369999 | 0.026 | 1.588 | 0.754 | BATCH_13 | Measurement | OTDR | 0.112 |
1.664 | 551.219971 | Air | 2.43 | LPCVD | Wet Etch | 4.05 | 900C_1hr | 1,524.540039 | TM | 4.68 | 30.209999 | 134.309998 | 17.5 | 9.703 | 4.679 | 74.889999 | 60.5 | 0.481 | 1.593 | 0.706 | BATCH_14 | Measurement | microring_Q | 0.152 |
1.914 | 567.679993 | Polymer | 1.11 | LPCVD | Wet Etch | 0.69 | 1000C_1hr | 1,553.920044 | TE | -1.48 | 56.529999 | 67.879997 | 35.580002 | 3.907 | 0.603 | 48.580002 | 71.800003 | 0.22 | 1.927 | 0.811 | BATCH_46 | Measurement | microring_Q | 0.14 |
1.233 | 280.890015 | Air | 1.97 | LPCVD | ICP | 4.62 | 900C_3hr | 1,533.170044 | TM | 2.04 | 56.130001 | 116.300003 | 27.16 | 2.015 | 0.104 | 40.450001 | 80.68 | 0.351 | 1.787 | 0.798 | BATCH_28 | Measurement | OTDR | 0.079 |
0.763 | 236.630005 | Polymer | 2.4 | LPCVD | ICP | 4.11 | 1000C_1hr | 1,575.060059 | TM | 5.67 | 58.200001 | 72.760002 | 28.049999 | 11.229 | 3.732 | 65.57 | 49.919998 | 0.141 | 1.665 | 0.743 | BATCH_24 | Synthetic | ring_resonance | 0.088 |
0.781 | 280.579987 | Air | 1.53 | PECVD | RIE | 3.13 | 900C_1hr | 1,547.130005 | TE | 7.14 | 26.99 | 168.949997 | 11.6 | 6.625 | 4.454 | 51.509998 | 59.549999 | 0.267 | 1.517 | 0.931 | BATCH_44 | Measurement | ring_resonance | 0.02 |
0.965 | 354.640015 | Air | 2.48 | PECVD | ICP | 4.04 | 1000C_1hr | 1,594.869995 | TE | 0.21 | 61.77 | 180.479996 | 40.779999 | 13.689 | 3.001 | 82.080002 | 86.690002 | 0.187 | 1.544 | 0.792 | BATCH_21 | Measurement | OTDR | 0.116 |
0.837 | 292.890015 | Air | 4.59 | LPCVD | RIE | 0.98 | 1000C_1hr | 1,544.47998 | TE | -5.22 | 22.25 | 116.980003 | 11.56 | 2.646 | 0.573 | 53.139999 | 54.689999 | 0.057 | 1.594 | 0.758 | BATCH_45 | Measurement | cut-back | 0.056 |
1.729 | 307.640015 | SiO2 | 4.88 | Sputtering | ICP | 0.65 | 900C_3hr | 1,572.920044 | TE | -8.66 | 79.18 | 191.470001 | 41.669998 | 6.784 | 1.257 | 83.220001 | 81.169998 | 0.148 | 1.655 | 0.881 | BATCH_24 | Synthetic | cut-back | 0.127 |
1.576 | 218.419998 | SiO2 | 2.42 | PECVD | Wet Etch | 4.82 | 900C_3hr | 1,577.890015 | TE | -8.87 | 53.959999 | 52.110001 | 13.21 | 2.522 | 1.448 | 66.970001 | 61.080002 | 0.293 | 1.635 | 0.731 | BATCH_10 | Measurement | cut-back | 0.046 |
0.815 | 554.400024 | Polymer | 1.4 | LPCVD | RIE | 1.85 | 900C_1hr | 1,564.439941 | TM | 7.45 | 31.57 | 132.210007 | 3.19 | 2.38 | 3.579 | 40.580002 | 80.730003 | 0.476 | 1.645 | 0.931 | BATCH_6 | Measurement | ring_resonance | 0.162 |
1.926 | 470 | SiO2 | 1.24 | PECVD | ICP | 1.87 | 900C_1hr | 1,505.900024 | TE | 4.63 | 33.5 | 74.910004 | 41.48 | 10.601 | 2.312 | 71.449997 | 54.32 | 0.332 | 1.712 | 0.863 | BATCH_43 | Synthetic | OTDR | 0.062 |
1.701 | 251.440002 | Polymer | 1.31 | PECVD | RIE | 0.59 | 1000C_1hr | 1,587.670044 | TE | -8.74 | 50.189999 | 198.729996 | 12.44 | 6.757 | 4.699 | 56.299999 | 60.52 | 0.26 | 1.869 | 0.89 | BATCH_5 | Synthetic | OTDR | 0.012 |
0.709 | 319.700012 | Polymer | 2.84 | PECVD | ICP | 4.59 | 900C_1hr | 1,585.319946 | TM | 5.46 | 66.269997 | 46.619999 | 22.709999 | 3.194 | 0.951 | 64.129997 | 42.509998 | 0.26 | 1.506 | 0.786 | BATCH_33 | Measurement | ring_resonance | 0.03 |
1.925 | 206.839996 | Air | 4.72 | Sputtering | Wet Etch | 1.02 | No_Anneal | 1,561.569946 | TM | -8.01 | 33.939999 | 74.169998 | 1.04 | 1.256 | 2.665 | 75.800003 | 62.040001 | 0.06 | 1.501 | 0.893 | BATCH_12 | Synthetic | ring_resonance | 0.075 |
0.559 | 515.5 | SiO2 | 2.14 | PECVD | RIE | 3.76 | 1000C_1hr | 1,511.300049 | TM | 3.79 | 68.690002 | 169.240005 | 3.03 | 1.424 | 2.012 | 47.970001 | 69.970001 | 0.304 | 1.776 | 0.714 | BATCH_14 | Synthetic | OTDR | 0.169 |
0.835 | 488.640015 | SiO2 | 1.21 | LPCVD | ICP | 4.18 | 900C_3hr | 1,524.300049 | TE | 7.21 | 29.120001 | 120.440002 | 27.209999 | 14.58 | 4.86 | 89.389999 | 70.660004 | 0.206 | 1.803 | 0.825 | BATCH_18 | Synthetic | cut-back | 0.147 |
1 | 225.369995 | Air | 4.69 | PECVD | RIE | 2.23 | 900C_3hr | 1,514.23999 | TM | -7.47 | 66.760002 | 191.75 | 16.190001 | 5.708 | 2.525 | 68.720001 | 49.060001 | 0.189 | 1.993 | 0.714 | BATCH_24 | Synthetic | microring_Q | 0.159 |
1.423 | 485.25 | SiO2 | 3.26 | LPCVD | Wet Etch | 0.84 | 900C_3hr | 1,568.319946 | TE | -3.92 | 47.599998 | 127.300003 | 16.6 | 4.672 | 1.675 | 77.75 | 72.379997 | 0.171 | 1.5 | 0.828 | BATCH_34 | Synthetic | cut-back | 0.076 |
1.598 | 242.559998 | SiO2 | 3.47 | LPCVD | Wet Etch | 3.24 | No_Anneal | 1,532.400024 | TE | -6.97 | 21.620001 | 24.719999 | 27.120001 | 10.661 | 3.727 | 69.57 | 45 | 0.201 | 1.793 | 0.848 | BATCH_33 | Measurement | microring_Q | 0.071 |
0.509 | 461.369995 | Polymer | 3.48 | Sputtering | Wet Etch | 0.62 | 1000C_1hr | 1,511.189941 | TM | 8.31 | 26.110001 | 32.799999 | 45.57 | 10.677 | 1.992 | 54.009998 | 43.380001 | 0.468 | 1.575 | 0.745 | BATCH_29 | Synthetic | cut-back | 0.03 |
1.433 | 273.679993 | Polymer | 3.47 | Sputtering | ICP | 4.97 | 900C_1hr | 1,593.810059 | TE | 7.32 | 21.809999 | 169.229996 | 11.26 | 2.814 | 0.799 | 49.34 | 40.139999 | 0.321 | 1.806 | 0.723 | BATCH_9 | Measurement | ring_resonance | 0.011 |
0.821 | 465.220001 | Polymer | 2.76 | Sputtering | RIE | 2.61 | 900C_1hr | 1,558.810059 | TM | 6.36 | 63.759998 | 158.979996 | 34.439999 | 18.179001 | 4.723 | 49.540001 | 54.259998 | 0.035 | 1.537 | 0.765 | BATCH_13 | Synthetic | cut-back | 0.117 |
1.511 | 598.599976 | Air | 1.19 | LPCVD | ICP | 3.49 | 900C_3hr | 1,591.949951 | TE | -4.59 | 49.060001 | 168.630005 | 30.809999 | 16.417999 | 4.707 | 62.09 | 65 | 0.163 | 1.903 | 0.808 | BATCH_13 | Measurement | microring_Q | 0.134 |
1.499 | 343.609985 | Air | 1.84 | PECVD | Wet Etch | 1.83 | 900C_1hr | 1,535.390015 | TM | -0.61 | 69.660004 | 105.849998 | 38.779999 | 19.466 | 4.833 | 57.560001 | 55.400002 | 0.293 | 1.542 | 0.842 | BATCH_30 | Measurement | OTDR | 0.188 |
1.262 | 294.709991 | Air | 1.94 | LPCVD | Wet Etch | 3.89 | No_Anneal | 1,525.339966 | TE | -8.96 | 77.980003 | 159.660004 | 26.65 | 10.956 | 3.578 | 65.669998 | 68.589996 | 0.218 | 1.501 | 0.814 | BATCH_36 | Synthetic | OTDR | 0.089 |
0.886 | 524.570007 | Polymer | 3.35 | PECVD | RIE | 1.21 | No_Anneal | 1,531.73999 | TM | -7.38 | 78.099998 | 64.290001 | 4.67 | 2.556 | 1.808 | 87.879997 | 62.490002 | 0.239 | 1.731 | 0.806 | BATCH_41 | Measurement | microring_Q | 0.134 |
1.597 | 495.859985 | Air | 2.18 | LPCVD | ICP | 2.18 | 900C_3hr | 1,504.930054 | TE | 3.29 | 71.25 | 138.580002 | 25.549999 | 9.549 | 3.224 | 52.049999 | 77.419998 | 0.099 | 1.785 | 0.794 | BATCH_2 | Synthetic | OTDR | 0.043 |
1.276 | 382.670013 | Polymer | 4.85 | PECVD | RIE | 0.76 | 900C_3hr | 1,595.02002 | TE | -3.9 | 48.529999 | 96.110001 | 22.469999 | 1.464 | 0.29 | 76.150002 | 40.41 | 0.371 | 1.738 | 0.733 | BATCH_12 | Measurement | ring_resonance | 0.196 |
1.028 | 419.200012 | Air | 3.38 | Sputtering | Wet Etch | 4.76 | 900C_1hr | 1,503.699951 | TE | 8.29 | 25.799999 | 157.929993 | 34.990002 | 7.27 | 1.806 | 68.029999 | 83.82 | 0.374 | 1.619 | 0.863 | BATCH_49 | Synthetic | microring_Q | 0.175 |
0.53 | 546.859985 | SiO2 | 4.92 | PECVD | Wet Etch | 4.78 | 1000C_1hr | 1,584.030029 | TM | 1.19 | 78.449997 | 37.639999 | 45.139999 | 13.526 | 2.648 | 89.620003 | 81.220001 | 0.354 | 1.546 | 0.924 | BATCH_46 | Synthetic | microring_Q | 0.179 |
1.639 | 581.080017 | Air | 2.24 | LPCVD | Wet Etch | 1.43 | 900C_3hr | 1,515.310059 | TE | -5.39 | 27.450001 | 190.630005 | 24.799999 | 11.431 | 3.916 | 85.040001 | 55.98 | 0.335 | 1.762 | 0.722 | BATCH_16 | Measurement | cut-back | 0.111 |
1.196 | 271.609985 | Air | 3.27 | PECVD | ICP | 0.92 | 900C_3hr | 1,598.280029 | TE | -8.76 | 21.99 | 193.960007 | 25 | 9.381 | 3.532 | 49.130001 | 43.110001 | 0.164 | 1.947 | 0.769 | BATCH_44 | Synthetic | microring_Q | 0.178 |
1.025 | 584.030029 | SiO2 | 1.69 | Sputtering | RIE | 3.43 | 1000C_1hr | 1,561.47998 | TM | 6.77 | 59.970001 | 57.740002 | 36.93 | 7.779 | 1.944 | 56.330002 | 51.740002 | 0.353 | 1.526 | 0.71 | BATCH_8 | Measurement | OTDR | 0.149 |
1.987 | 292.429993 | Polymer | 3.83 | PECVD | RIE | 1.16 | 900C_3hr | 1,503.780029 | TE | 4.56 | 53.82 | 113.199997 | 40.110001 | 3.203 | 0.404 | 45.93 | 76.089996 | 0.485 | 1.872 | 0.834 | BATCH_34 | Synthetic | OTDR | 0.2 |
1.028 | 247.630005 | Air | 2.38 | PECVD | ICP | 3.28 | 1000C_1hr | 1,589.5 | TE | 2.55 | 74.389999 | 86.349998 | 12.01 | 7.064 | 4.601 | 47.900002 | 61.349998 | 0.454 | 1.55 | 0.799 | BATCH_7 | Synthetic | OTDR | 0.069 |
0.665 | 254.720001 | Polymer | 3.66 | LPCVD | RIE | 1.18 | 1000C_1hr | 1,585.01001 | TM | -5.34 | 65.529999 | 90.93 | 39.169998 | 18.468 | 4.55 | 80.57 | 67.800003 | 0.437 | 1.536 | 0.753 | BATCH_19 | Synthetic | OTDR | 0.092 |
1.753 | 248.5 | SiO2 | 3.1 | LPCVD | RIE | 3.2 | 1000C_1hr | 1,517.079956 | TE | 1.26 | 78.139999 | 122.900002 | 49.189999 | 8.251 | 1.45 | 75.620003 | 81.230003 | 0.2 | 1.559 | 0.934 | BATCH_15 | Measurement | cut-back | 0.189 |
1.263 | 548.030029 | SiO2 | 4.99 | LPCVD | RIE | 4.54 | 900C_1hr | 1,547.97998 | TM | 9.9 | 34.52 | 150.259995 | 23.440001 | 3.279 | 0.846 | 80.029999 | 70.529999 | 0.02 | 1.612 | 0.841 | BATCH_30 | Synthetic | ring_resonance | 0.101 |
1.057 | 564.799988 | Polymer | 4.4 | LPCVD | ICP | 2.38 | 900C_3hr | 1,561.189941 | TE | 8.12 | 66.349998 | 73.089996 | 3.97 | 2.102 | 2.446 | 59.060001 | 61.799999 | 0.277 | 1.695 | 0.949 | BATCH_40 | Measurement | cut-back | 0.046 |
1.512 | 238.100006 | Polymer | 3.01 | Sputtering | ICP | 4.04 | 900C_1hr | 1,591.459961 | TM | 3.24 | 47.990002 | 70.589996 | 18.09 | 9.79 | 4.33 | 56.16 | 56 | 0.052 | 1.95 | 0.801 | BATCH_31 | Synthetic | ring_resonance | 0.104 |
0.954 | 282.809998 | SiO2 | 3.79 | LPCVD | RIE | 4.99 | 900C_1hr | 1,579.219971 | TM | 9.98 | 77.050003 | 39.630001 | 20.5 | 11.508 | 4.745 | 45.759998 | 72.660004 | 0.166 | 1.733 | 0.777 | BATCH_20 | Measurement | ring_resonance | 0.056 |
1.039 | 424.059998 | Polymer | 4.55 | LPCVD | RIE | 2.64 | 900C_1hr | 1,567.98999 | TM | -8.86 | 27.07 | 46.139999 | 37.91 | 18.372999 | 4.636 | 82.209999 | 81.75 | 0.246 | 1.674 | 0.933 | BATCH_14 | Synthetic | OTDR | 0.12 |
0.711 | 560.109985 | SiO2 | 3.7 | LPCVD | ICP | 1.88 | 1000C_1hr | 1,554.98999 | TM | 4.08 | 68.489998 | 101.260002 | 10.99 | 3.699 | 2.144 | 84.889999 | 58.599998 | 0.061 | 1.986 | 0.891 | BATCH_17 | Synthetic | OTDR | 0.128 |
1.489 | 444.51001 | Polymer | 3.23 | LPCVD | Wet Etch | 1.99 | 900C_3hr | 1,592.22998 | TM | -1.44 | 70.760002 | 118.730003 | 47.23 | 19.186001 | 3.89 | 66.360001 | 45.73 | 0.365 | 1.69 | 0.806 | BATCH_21 | Synthetic | OTDR | 0.186 |
0.977 | 320.76001 | SiO2 | 3.12 | PECVD | Wet Etch | 2.31 | No_Anneal | 1,574.51001 | TM | 6.4 | 39.66 | 71.059998 | 25.91 | 7.642 | 2.62 | 61.279999 | 50.130001 | 0.415 | 1.682 | 0.886 | BATCH_11 | Synthetic | ring_resonance | 0.165 |
1.322 | 495.850006 | Polymer | 4.61 | LPCVD | ICP | 2.39 | 1000C_1hr | 1,555.01001 | TM | 1.48 | 40.790001 | 59.200001 | 30.09 | 3.918 | 1.004 | 81.800003 | 57.98 | 0.274 | 1.951 | 0.71 | BATCH_34 | Measurement | OTDR | 0.028 |
0.69 | 389.970001 | SiO2 | 1.51 | LPCVD | RIE | 3.27 | No_Anneal | 1,554.5 | TE | -3.54 | 75.970001 | 89.82 | 9.14 | 2.459 | 1.33 | 58.77 | 84.839996 | 0.155 | 1.97 | 0.948 | BATCH_1 | Synthetic | OTDR | 0.099 |
1.348 | 341.380005 | Air | 2.18 | LPCVD | ICP | 3.2 | 1000C_1hr | 1,543.920044 | TM | 4.09 | 60.330002 | 100.300003 | 7.37 | 2.572 | 1.095 | 52.98 | 71.830002 | 0.416 | 1.864 | 0.748 | BATCH_42 | Measurement | cut-back | 0.083 |