waveguide_width
float32
0.5
2
waveguide_height
float32
200
600
cladding_material
stringclasses
3 values
cladding_thickness
float32
1
5
deposition_method
stringclasses
3 values
etch_method
stringclasses
3 values
sidewall_roughness
float32
0.5
5
annealing_params
stringclasses
4 values
wavelength
float32
1.5k
1.6k
polarization
stringclasses
2 values
input_power
float32
-10
10
temperature
float32
20
80
bend_radius
float32
20
200
device_length
float32
1
50
insertion_loss
float32
0.53
26.5
propagation_loss
float32
0.1
5
coupling_efficiency_input
float32
40
90
coupling_efficiency_output
float32
40
90
scattering_loss
float32
0.01
0.5
effective_index
float32
1.5
2
mode_confinement_factor
float32
0.7
0.95
batch_id
stringclasses
50 values
data_source
stringclasses
2 values
measurement_method
stringclasses
4 values
uncertainty
float32
0.01
0.2
1.888
402.950012
Polymer
2.58
PECVD
RIE
1.24
900C_3hr
1,546.430054
TM
0.54
55.080002
149.960007
12.57
4.47
2.62
85.559998
88.209999
0.179
1.714
0.875
BATCH_50
Measurement
microring_Q
0.051
1.928
517.900024
SiO2
1.23
PECVD
Wet Etch
1.67
1000C_1hr
1,550.829956
TE
-7.1
49.889999
131.669998
32.57
16.304001
4.744
77.230003
50.07
0.213
1.768
0.855
BATCH_16
Measurement
OTDR
0.025
1.598
227.399994
Air
2.21
LPCVD
RIE
3.45
900C_1hr
1,502.670044
TM
-8.6
64.230003
107.470001
39.209999
17.705
4.173
57.040001
55.400002
0.066
1.896
0.726
BATCH_36
Measurement
ring_resonance
0.063
0.786
238.070007
SiO2
3.01
PECVD
Wet Etch
3.68
No_Anneal
1,596.829956
TE
-5.12
72.330002
42.939999
34.119999
12.992
3.331
59.630001
58.98
0.176
1.882
0.823
BATCH_17
Synthetic
microring_Q
0.074
0.696
337.160004
Polymer
3.98
Sputtering
ICP
2
1000C_1hr
1,552.390015
TE
6.6
51.470001
127.68
49.580002
7.558
1.218
55.630001
83.440002
0.342
1.952
0.841
BATCH_22
Measurement
cut-back
0.194
0.828
377.559998
Air
4.12
PECVD
ICP
1.64
No_Anneal
1,564.030029
TE
-6.14
77.190002
49.939999
25.23
9.792
3.563
55.029999
52.970001
0.447
1.815
0.79
BATCH_11
Measurement
ring_resonance
0.16
0.787
247.059998
Air
2.45
Sputtering
Wet Etch
1.72
No_Anneal
1,507.569946
TE
-8.86
59.889999
82.389999
20.690001
8.193
3
50.25
68.870003
0.294
1.93
0.924
BATCH_12
Synthetic
microring_Q
0.03
0.891
369.880005
Polymer
4.95
Sputtering
Wet Etch
3.78
900C_3hr
1,544.900024
TE
4.17
26.700001
113.230003
12.39
2.742
1.203
79.940002
80.410004
0.039
1.508
0.849
BATCH_16
Synthetic
cut-back
0.188
1.999
288.140015
Air
1.87
Sputtering
ICP
4.11
900C_1hr
1,592.22998
TM
7.84
37.830002
172.279999
43.889999
3.156
0.311
63.849998
62.23
0.266
1.869
0.741
BATCH_22
Measurement
cut-back
0.088
1.764
405.369995
Air
1.25
LPCVD
RIE
1.72
1000C_1hr
1,511.569946
TM
9.56
45.849998
199.110001
9.82
4.166
3.079
68.410004
82.860001
0.352
1.958
0.848
BATCH_24
Measurement
OTDR
0.141
1.72
272.880005
SiO2
4.35
LPCVD
ICP
2.36
1000C_1hr
1,583.400024
TE
-1.93
37.529999
76.040001
29.969999
11.876
3.422
89.110001
63.200001
0.354
1.735
0.714
BATCH_35
Synthetic
microring_Q
0.111
1.619
226.559998
Air
3.07
PECVD
ICP
0.73
900C_1hr
1,507.560059
TE
2.29
79.449997
52.630001
27.65
13.272
4.393
69.459999
48.950001
0.025
1.929
0.745
BATCH_2
Synthetic
OTDR
0.127
1.539
236.350006
Air
1.23
Sputtering
RIE
3.96
No_Anneal
1,536.280029
TM
-1.49
63.41
193.130005
40.779999
9.978
1.968
40.68
69.410004
0.092
1.923
0.759
BATCH_10
Synthetic
OTDR
0.155
1.763
531.26001
Air
3.85
LPCVD
ICP
4.12
900C_1hr
1,516.890015
TE
3.97
52.869999
199.850006
4.66
3.55
3.49
63.900002
57.240002
0.337
1.818
0.922
BATCH_29
Synthetic
ring_resonance
0.018
0.643
559.049988
Polymer
1.12
PECVD
ICP
3.01
1000C_1hr
1,597.030029
TE
-8.68
36.189999
83.599998
10.68
5.218
3.697
43.060001
40.040001
0.244
1.596
0.922
BATCH_46
Synthetic
OTDR
0.088
1.559
206.020004
SiO2
1.66
PECVD
Wet Etch
4.53
900C_1hr
1,591.680054
TE
-9.7
57.580002
99.639999
3.31
2.539
3.459
48.669998
62.400002
0.384
1.567
0.7
BATCH_8
Synthetic
cut-back
0.068
1.202
534.890015
SiO2
2.31
Sputtering
Wet Etch
4.01
900C_1hr
1,596.800049
TM
7.9
36.34
93.879997
20.92
9.271
3.52
82.589996
72.260002
0.277
1.76
0.758
BATCH_10
Synthetic
cut-back
0.043
1.132
221.240005
Air
3.23
PECVD
RIE
1.25
No_Anneal
1,574.099976
TM
-6.77
62.740002
88.889999
4.57
2.893
4.016
51.099998
89.620003
0.164
1.953
0.788
BATCH_41
Measurement
ring_resonance
0.141
0.883
391.040009
SiO2
1.09
Sputtering
RIE
2.5
900C_1hr
1,547.569946
TM
-9.63
31.93
137.729996
38.130001
7.063
1.507
72.309998
46.610001
0.161
1.99
0.898
BATCH_12
Synthetic
ring_resonance
0.179
0.624
574.179993
Air
3.85
PECVD
ICP
2.88
No_Anneal
1,548.459961
TE
-0.66
37.919998
72.580002
3.34
2.27
0.995
63.939999
47.41
0.15
1.849
0.77
BATCH_24
Synthetic
cut-back
0.021
0.859
370.709991
SiO2
3.99
LPCVD
Wet Etch
1.02
900C_3hr
1,503.819946
TE
-7.43
55.110001
151.130005
10.78
5.745
4.459
78.160004
71.110001
0.419
1.541
0.803
BATCH_3
Measurement
ring_resonance
0.02
1.372
320.170013
Air
4.33
PECVD
ICP
1.27
No_Anneal
1,588.150024
TM
3.87
28.280001
172.839996
39.889999
20.378
4.854
87.82
56.150002
0.486
1.587
0.834
BATCH_46
Synthetic
OTDR
0.078
1.761
391.589996
SiO2
4.91
PECVD
ICP
0.93
900C_1hr
1,515.77002
TM
-6.81
67.029999
194.429993
15.73
8.524
4.944
69.510002
51.34
0.137
1.88
0.937
BATCH_48
Measurement
OTDR
0.043
1.962
252.029999
Polymer
3.85
Sputtering
ICP
2.73
900C_3hr
1,523.569946
TM
-6.86
57.849998
175.279999
27.540001
6.742
1.844
66.980003
89.089996
0.06
1.921
0.713
BATCH_15
Measurement
microring_Q
0.138
1.558
498.25
Polymer
4.7
PECVD
ICP
2.66
No_Anneal
1,598.449951
TE
-3.57
68.959999
99.550003
39.32
8.646
1.873
78.309998
42.110001
0.306
1.998
0.922
BATCH_46
Measurement
ring_resonance
0.067
0.85
380.720001
SiO2
3.26
PECVD
ICP
0.94
1000C_1hr
1,589.699951
TE
-5.88
42.900002
101.400002
4.57
0.687
0.259
80.190002
82.059998
0.184
1.934
0.896
BATCH_8
Synthetic
OTDR
0.125
0.962
343.980011
Air
4.95
PECVD
RIE
4.2
900C_1hr
1,588.780029
TE
-5.59
46.939999
42.220001
26.42
13.556
4.418
50.48
64.019997
0.027
1.892
0.793
BATCH_19
Synthetic
ring_resonance
0.133
0.56
406.109985
Polymer
4.09
LPCVD
Wet Etch
0.89
900C_3hr
1,545.22998
TM
4.65
62.18
46.75
29.68
3.999
0.983
49.91
50.950001
0.013
1.699
0.726
BATCH_16
Synthetic
OTDR
0.076
1.948
211.070007
SiO2
1.38
Sputtering
Wet Etch
0.93
900C_1hr
1,547.069946
TE
-5.28
64.879997
181.690002
47.009998
13.099
2.606
52.009998
69.389999
0.238
1.686
0.935
BATCH_22
Synthetic
ring_resonance
0.038
1.144
238.25
SiO2
3.24
Sputtering
Wet Etch
1.74
1000C_1hr
1,530.790039
TM
6.45
52.669998
37.080002
20.1
2.528
0.46
44.419998
85.290001
0.274
1.782
0.889
BATCH_36
Measurement
microring_Q
0.063
1.457
337.48999
SiO2
4.25
PECVD
RIE
4.68
1000C_1hr
1,530.619995
TE
1.92
72.900002
165.619995
29.790001
9.522
2.541
64.449997
77.919998
0.024
1.568
0.757
BATCH_22
Synthetic
cut-back
0.1
0.801
330.630005
SiO2
2.98
PECVD
Wet Etch
0.95
No_Anneal
1,525.949951
TE
9.48
32.380001
72.43
26.34
9.597
3.124
79.300003
56.220001
0.484
1.653
0.874
BATCH_34
Synthetic
cut-back
0.082
1.013
372.079987
Air
4.76
Sputtering
ICP
3.66
No_Anneal
1,515.859985
TM
5.17
45.919998
157.179993
13.17
5.87
3.896
66.050003
66.050003
0.018
1.869
0.715
BATCH_6
Synthetic
microring_Q
0.126
0.898
287.220001
Polymer
3.36
PECVD
RIE
4.21
No_Anneal
1,554.52002
TM
8.71
25.780001
106.919998
18.299999
1.681
0.377
79.080002
46.59
0.223
1.641
0.843
BATCH_18
Measurement
OTDR
0.094
1.506
585.72998
Air
1.27
Sputtering
ICP
1.64
No_Anneal
1,501.98999
TE
-4.97
78.080002
94.57
42.509998
18.473
3.985
78.580002
41.59
0.09
1.796
0.822
BATCH_43
Synthetic
microring_Q
0.076
1.96
233.070007
Air
3.83
Sputtering
Wet Etch
2.6
900C_3hr
1,584.689941
TE
4.23
51.290001
50.759998
6.43
2.873
3.302
63.77
68.550003
0.377
1.691
0.714
BATCH_37
Measurement
OTDR
0.073
1.389
210.690002
Polymer
4.88
PECVD
Wet Etch
3.13
1000C_1hr
1,555.27002
TM
3.52
73.43
101.980003
5.71
3.299
4.028
49.48
85.970001
0.054
1.831
0.847
BATCH_43
Measurement
OTDR
0.031
1.935
379.820007
Polymer
4.68
LPCVD
RIE
0.65
900C_3hr
1,501.650024
TE
-7.38
64.209999
172.940002
23.73
7.12
2.56
78.169998
87.669998
0.249
1.767
0.783
BATCH_30
Measurement
microring_Q
0.13
1.609
581.460022
SiO2
4.89
PECVD
Wet Etch
2.09
1000C_1hr
1,501.670044
TM
-6.35
72.699997
80.870003
16.5
3.056
0.992
73.709999
68.739998
0.201
1.876
0.934
BATCH_37
Measurement
microring_Q
0.162
1.83
404.75
Air
4.78
LPCVD
ICP
4.03
1000C_1hr
1,547.800049
TE
-4.38
21.389999
45.41
37.029999
14.952
3.527
87.889999
73.910004
0.148
1.527
0.765
BATCH_47
Measurement
ring_resonance
0.166
1.924
277.200012
SiO2
1.31
PECVD
ICP
4.17
900C_3hr
1,524.25
TM
-7.22
61.060001
29.4
33.419998
8.973
2.504
57.669998
67.849998
0.214
1.775
0.91
BATCH_19
Synthetic
microring_Q
0.032
0.789
221.039993
Polymer
1.58
Sputtering
Wet Etch
3.48
No_Anneal
1,584.5
TE
-4.01
47.049999
188.630005
5.92
1.261
0.803
80.790001
48.619999
0.43
1.806
0.922
BATCH_18
Measurement
ring_resonance
0.027
0.735
542.200012
SiO2
3.33
PECVD
ICP
1.95
900C_3hr
1,564.680054
TM
7.2
36.349998
171.139999
15.34
7.857
4.127
85.57
72.279999
0.068
1.775
0.894
BATCH_37
Synthetic
cut-back
0.026
1.579
585.419983
Polymer
1.19
PECVD
Wet Etch
3.58
900C_3hr
1,532.390015
TM
-3.43
38.080002
107.709999
45.290001
6.686
1.187
62.669998
41.099998
0.132
1.651
0.894
BATCH_6
Measurement
microring_Q
0.107
1.322
435.540009
Air
3.81
Sputtering
RIE
1.55
1000C_1hr
1,540.459961
TM
-3.97
28.27
166.619995
26.08
3.382
0.657
83.639999
45.73
0.192
1.619
0.869
BATCH_43
Measurement
OTDR
0.13
0.895
444.329987
Air
4.6
LPCVD
ICP
2.52
900C_1hr
1,505.040039
TE
-8.58
57.110001
175.570007
21
9.65
3.695
83.230003
71.010002
0.424
1.803
0.761
BATCH_42
Synthetic
OTDR
0.181
1.875
394.019989
SiO2
4.69
PECVD
Wet Etch
3.68
No_Anneal
1,562.569946
TM
-2.25
28.559999
150.839996
29.879999
7.032
1.952
65.75
78.019997
0.017
1.98
0.771
BATCH_19
Synthetic
microring_Q
0.027
1.168
322.149994
Polymer
2.22
LPCVD
Wet Etch
4.48
900C_1hr
1,598.959961
TE
1.23
70.25
142.419998
33.369999
14.523
4.074
86.43
80.480003
0.462
1.709
0.947
BATCH_3
Measurement
microring_Q
0.132
1.363
307.339996
Polymer
2.81
LPCVD
Wet Etch
4.41
900C_1hr
1,593.530029
TE
1.95
56.16
50.349998
10.42
5.453
3.523
80.550003
63.07
0.217
1.924
0.875
BATCH_35
Measurement
microring_Q
0.056
0.554
534.440002
Polymer
3.76
Sputtering
Wet Etch
2.07
900C_1hr
1,516.160034
TM
-4.05
59.990002
68.610001
44.43
12.857
2.731
80.790001
68.93
0.027
1.581
0.945
BATCH_41
Measurement
microring_Q
0.114
1.512
277.290009
Air
4.54
PECVD
Wet Etch
3.54
1000C_1hr
1,517.069946
TM
5.62
59.360001
81.459999
8.35
5.033
4.218
81.050003
42.259998
0.445
1.557
0.845
BATCH_47
Synthetic
microring_Q
0.104
0.505
584.77002
Air
2.84
LPCVD
RIE
4.32
900C_1hr
1,513.869995
TM
9.29
30.440001
177.990005
14.44
6.387
3.998
52.02
46.369999
0.026
1.588
0.754
BATCH_13
Measurement
OTDR
0.112
1.664
551.219971
Air
2.43
LPCVD
Wet Etch
4.05
900C_1hr
1,524.540039
TM
4.68
30.209999
134.309998
17.5
9.703
4.679
74.889999
60.5
0.481
1.593
0.706
BATCH_14
Measurement
microring_Q
0.152
1.914
567.679993
Polymer
1.11
LPCVD
Wet Etch
0.69
1000C_1hr
1,553.920044
TE
-1.48
56.529999
67.879997
35.580002
3.907
0.603
48.580002
71.800003
0.22
1.927
0.811
BATCH_46
Measurement
microring_Q
0.14
1.233
280.890015
Air
1.97
LPCVD
ICP
4.62
900C_3hr
1,533.170044
TM
2.04
56.130001
116.300003
27.16
2.015
0.104
40.450001
80.68
0.351
1.787
0.798
BATCH_28
Measurement
OTDR
0.079
0.763
236.630005
Polymer
2.4
LPCVD
ICP
4.11
1000C_1hr
1,575.060059
TM
5.67
58.200001
72.760002
28.049999
11.229
3.732
65.57
49.919998
0.141
1.665
0.743
BATCH_24
Synthetic
ring_resonance
0.088
0.781
280.579987
Air
1.53
PECVD
RIE
3.13
900C_1hr
1,547.130005
TE
7.14
26.99
168.949997
11.6
6.625
4.454
51.509998
59.549999
0.267
1.517
0.931
BATCH_44
Measurement
ring_resonance
0.02
0.965
354.640015
Air
2.48
PECVD
ICP
4.04
1000C_1hr
1,594.869995
TE
0.21
61.77
180.479996
40.779999
13.689
3.001
82.080002
86.690002
0.187
1.544
0.792
BATCH_21
Measurement
OTDR
0.116
0.837
292.890015
Air
4.59
LPCVD
RIE
0.98
1000C_1hr
1,544.47998
TE
-5.22
22.25
116.980003
11.56
2.646
0.573
53.139999
54.689999
0.057
1.594
0.758
BATCH_45
Measurement
cut-back
0.056
1.729
307.640015
SiO2
4.88
Sputtering
ICP
0.65
900C_3hr
1,572.920044
TE
-8.66
79.18
191.470001
41.669998
6.784
1.257
83.220001
81.169998
0.148
1.655
0.881
BATCH_24
Synthetic
cut-back
0.127
1.576
218.419998
SiO2
2.42
PECVD
Wet Etch
4.82
900C_3hr
1,577.890015
TE
-8.87
53.959999
52.110001
13.21
2.522
1.448
66.970001
61.080002
0.293
1.635
0.731
BATCH_10
Measurement
cut-back
0.046
0.815
554.400024
Polymer
1.4
LPCVD
RIE
1.85
900C_1hr
1,564.439941
TM
7.45
31.57
132.210007
3.19
2.38
3.579
40.580002
80.730003
0.476
1.645
0.931
BATCH_6
Measurement
ring_resonance
0.162
1.926
470
SiO2
1.24
PECVD
ICP
1.87
900C_1hr
1,505.900024
TE
4.63
33.5
74.910004
41.48
10.601
2.312
71.449997
54.32
0.332
1.712
0.863
BATCH_43
Synthetic
OTDR
0.062
1.701
251.440002
Polymer
1.31
PECVD
RIE
0.59
1000C_1hr
1,587.670044
TE
-8.74
50.189999
198.729996
12.44
6.757
4.699
56.299999
60.52
0.26
1.869
0.89
BATCH_5
Synthetic
OTDR
0.012
0.709
319.700012
Polymer
2.84
PECVD
ICP
4.59
900C_1hr
1,585.319946
TM
5.46
66.269997
46.619999
22.709999
3.194
0.951
64.129997
42.509998
0.26
1.506
0.786
BATCH_33
Measurement
ring_resonance
0.03
1.925
206.839996
Air
4.72
Sputtering
Wet Etch
1.02
No_Anneal
1,561.569946
TM
-8.01
33.939999
74.169998
1.04
1.256
2.665
75.800003
62.040001
0.06
1.501
0.893
BATCH_12
Synthetic
ring_resonance
0.075
0.559
515.5
SiO2
2.14
PECVD
RIE
3.76
1000C_1hr
1,511.300049
TM
3.79
68.690002
169.240005
3.03
1.424
2.012
47.970001
69.970001
0.304
1.776
0.714
BATCH_14
Synthetic
OTDR
0.169
0.835
488.640015
SiO2
1.21
LPCVD
ICP
4.18
900C_3hr
1,524.300049
TE
7.21
29.120001
120.440002
27.209999
14.58
4.86
89.389999
70.660004
0.206
1.803
0.825
BATCH_18
Synthetic
cut-back
0.147
1
225.369995
Air
4.69
PECVD
RIE
2.23
900C_3hr
1,514.23999
TM
-7.47
66.760002
191.75
16.190001
5.708
2.525
68.720001
49.060001
0.189
1.993
0.714
BATCH_24
Synthetic
microring_Q
0.159
1.423
485.25
SiO2
3.26
LPCVD
Wet Etch
0.84
900C_3hr
1,568.319946
TE
-3.92
47.599998
127.300003
16.6
4.672
1.675
77.75
72.379997
0.171
1.5
0.828
BATCH_34
Synthetic
cut-back
0.076
1.598
242.559998
SiO2
3.47
LPCVD
Wet Etch
3.24
No_Anneal
1,532.400024
TE
-6.97
21.620001
24.719999
27.120001
10.661
3.727
69.57
45
0.201
1.793
0.848
BATCH_33
Measurement
microring_Q
0.071
0.509
461.369995
Polymer
3.48
Sputtering
Wet Etch
0.62
1000C_1hr
1,511.189941
TM
8.31
26.110001
32.799999
45.57
10.677
1.992
54.009998
43.380001
0.468
1.575
0.745
BATCH_29
Synthetic
cut-back
0.03
1.433
273.679993
Polymer
3.47
Sputtering
ICP
4.97
900C_1hr
1,593.810059
TE
7.32
21.809999
169.229996
11.26
2.814
0.799
49.34
40.139999
0.321
1.806
0.723
BATCH_9
Measurement
ring_resonance
0.011
0.821
465.220001
Polymer
2.76
Sputtering
RIE
2.61
900C_1hr
1,558.810059
TM
6.36
63.759998
158.979996
34.439999
18.179001
4.723
49.540001
54.259998
0.035
1.537
0.765
BATCH_13
Synthetic
cut-back
0.117
1.511
598.599976
Air
1.19
LPCVD
ICP
3.49
900C_3hr
1,591.949951
TE
-4.59
49.060001
168.630005
30.809999
16.417999
4.707
62.09
65
0.163
1.903
0.808
BATCH_13
Measurement
microring_Q
0.134
1.499
343.609985
Air
1.84
PECVD
Wet Etch
1.83
900C_1hr
1,535.390015
TM
-0.61
69.660004
105.849998
38.779999
19.466
4.833
57.560001
55.400002
0.293
1.542
0.842
BATCH_30
Measurement
OTDR
0.188
1.262
294.709991
Air
1.94
LPCVD
Wet Etch
3.89
No_Anneal
1,525.339966
TE
-8.96
77.980003
159.660004
26.65
10.956
3.578
65.669998
68.589996
0.218
1.501
0.814
BATCH_36
Synthetic
OTDR
0.089
0.886
524.570007
Polymer
3.35
PECVD
RIE
1.21
No_Anneal
1,531.73999
TM
-7.38
78.099998
64.290001
4.67
2.556
1.808
87.879997
62.490002
0.239
1.731
0.806
BATCH_41
Measurement
microring_Q
0.134
1.597
495.859985
Air
2.18
LPCVD
ICP
2.18
900C_3hr
1,504.930054
TE
3.29
71.25
138.580002
25.549999
9.549
3.224
52.049999
77.419998
0.099
1.785
0.794
BATCH_2
Synthetic
OTDR
0.043
1.276
382.670013
Polymer
4.85
PECVD
RIE
0.76
900C_3hr
1,595.02002
TE
-3.9
48.529999
96.110001
22.469999
1.464
0.29
76.150002
40.41
0.371
1.738
0.733
BATCH_12
Measurement
ring_resonance
0.196
1.028
419.200012
Air
3.38
Sputtering
Wet Etch
4.76
900C_1hr
1,503.699951
TE
8.29
25.799999
157.929993
34.990002
7.27
1.806
68.029999
83.82
0.374
1.619
0.863
BATCH_49
Synthetic
microring_Q
0.175
0.53
546.859985
SiO2
4.92
PECVD
Wet Etch
4.78
1000C_1hr
1,584.030029
TM
1.19
78.449997
37.639999
45.139999
13.526
2.648
89.620003
81.220001
0.354
1.546
0.924
BATCH_46
Synthetic
microring_Q
0.179
1.639
581.080017
Air
2.24
LPCVD
Wet Etch
1.43
900C_3hr
1,515.310059
TE
-5.39
27.450001
190.630005
24.799999
11.431
3.916
85.040001
55.98
0.335
1.762
0.722
BATCH_16
Measurement
cut-back
0.111
1.196
271.609985
Air
3.27
PECVD
ICP
0.92
900C_3hr
1,598.280029
TE
-8.76
21.99
193.960007
25
9.381
3.532
49.130001
43.110001
0.164
1.947
0.769
BATCH_44
Synthetic
microring_Q
0.178
1.025
584.030029
SiO2
1.69
Sputtering
RIE
3.43
1000C_1hr
1,561.47998
TM
6.77
59.970001
57.740002
36.93
7.779
1.944
56.330002
51.740002
0.353
1.526
0.71
BATCH_8
Measurement
OTDR
0.149
1.987
292.429993
Polymer
3.83
PECVD
RIE
1.16
900C_3hr
1,503.780029
TE
4.56
53.82
113.199997
40.110001
3.203
0.404
45.93
76.089996
0.485
1.872
0.834
BATCH_34
Synthetic
OTDR
0.2
1.028
247.630005
Air
2.38
PECVD
ICP
3.28
1000C_1hr
1,589.5
TE
2.55
74.389999
86.349998
12.01
7.064
4.601
47.900002
61.349998
0.454
1.55
0.799
BATCH_7
Synthetic
OTDR
0.069
0.665
254.720001
Polymer
3.66
LPCVD
RIE
1.18
1000C_1hr
1,585.01001
TM
-5.34
65.529999
90.93
39.169998
18.468
4.55
80.57
67.800003
0.437
1.536
0.753
BATCH_19
Synthetic
OTDR
0.092
1.753
248.5
SiO2
3.1
LPCVD
RIE
3.2
1000C_1hr
1,517.079956
TE
1.26
78.139999
122.900002
49.189999
8.251
1.45
75.620003
81.230003
0.2
1.559
0.934
BATCH_15
Measurement
cut-back
0.189
1.263
548.030029
SiO2
4.99
LPCVD
RIE
4.54
900C_1hr
1,547.97998
TM
9.9
34.52
150.259995
23.440001
3.279
0.846
80.029999
70.529999
0.02
1.612
0.841
BATCH_30
Synthetic
ring_resonance
0.101
1.057
564.799988
Polymer
4.4
LPCVD
ICP
2.38
900C_3hr
1,561.189941
TE
8.12
66.349998
73.089996
3.97
2.102
2.446
59.060001
61.799999
0.277
1.695
0.949
BATCH_40
Measurement
cut-back
0.046
1.512
238.100006
Polymer
3.01
Sputtering
ICP
4.04
900C_1hr
1,591.459961
TM
3.24
47.990002
70.589996
18.09
9.79
4.33
56.16
56
0.052
1.95
0.801
BATCH_31
Synthetic
ring_resonance
0.104
0.954
282.809998
SiO2
3.79
LPCVD
RIE
4.99
900C_1hr
1,579.219971
TM
9.98
77.050003
39.630001
20.5
11.508
4.745
45.759998
72.660004
0.166
1.733
0.777
BATCH_20
Measurement
ring_resonance
0.056
1.039
424.059998
Polymer
4.55
LPCVD
RIE
2.64
900C_1hr
1,567.98999
TM
-8.86
27.07
46.139999
37.91
18.372999
4.636
82.209999
81.75
0.246
1.674
0.933
BATCH_14
Synthetic
OTDR
0.12
0.711
560.109985
SiO2
3.7
LPCVD
ICP
1.88
1000C_1hr
1,554.98999
TM
4.08
68.489998
101.260002
10.99
3.699
2.144
84.889999
58.599998
0.061
1.986
0.891
BATCH_17
Synthetic
OTDR
0.128
1.489
444.51001
Polymer
3.23
LPCVD
Wet Etch
1.99
900C_3hr
1,592.22998
TM
-1.44
70.760002
118.730003
47.23
19.186001
3.89
66.360001
45.73
0.365
1.69
0.806
BATCH_21
Synthetic
OTDR
0.186
0.977
320.76001
SiO2
3.12
PECVD
Wet Etch
2.31
No_Anneal
1,574.51001
TM
6.4
39.66
71.059998
25.91
7.642
2.62
61.279999
50.130001
0.415
1.682
0.886
BATCH_11
Synthetic
ring_resonance
0.165
1.322
495.850006
Polymer
4.61
LPCVD
ICP
2.39
1000C_1hr
1,555.01001
TM
1.48
40.790001
59.200001
30.09
3.918
1.004
81.800003
57.98
0.274
1.951
0.71
BATCH_34
Measurement
OTDR
0.028
0.69
389.970001
SiO2
1.51
LPCVD
RIE
3.27
No_Anneal
1,554.5
TE
-3.54
75.970001
89.82
9.14
2.459
1.33
58.77
84.839996
0.155
1.97
0.948
BATCH_1
Synthetic
OTDR
0.099
1.348
341.380005
Air
2.18
LPCVD
ICP
3.2
1000C_1hr
1,543.920044
TM
4.09
60.330002
100.300003
7.37
2.572
1.095
52.98
71.830002
0.416
1.864
0.748
BATCH_42
Measurement
cut-back
0.083